Use of hexamethyldisiloxane for p-type microcrystalline silicon oxycarbide layers
The use of hexamethyldisiloxane (HMDSO) as an oxygen source for the Memory Foam Mattress growth of p-type silicon-based layers deposited by Plasma Enhanced Chemical Vapor Deposition is evaluated.The use of this source led to the incorporation of almost equivalent amounts of oxygen and carbon, resulting in microcrystalline silicon oxycarbide thin fi